Si+BN薄膜,BN Film coated by sputtering method
产品介绍
Boron nitride is a chemical compound with chemical formula BN, consisting of equal numbers of boron d nitrogen atoms. BN is isoelectronic to a similarly structured carbon lattice d thus exists in various crystalline forms. The Cubic (sphalerite structure) bariety alogous to diamond is called c-BN. Its hardness is inferior only to diamond, but its thermal d chemical stability is superior. Low-pressure deposition of thin films of boron nitride are grown on Si (100) wafers for this product. · BN Film coated by sputtering method · BN Thickness: 24 nm +/- 10% · Conductive type: Si n- type · Resistivity: 1- 10 ohm-cm · Size: 4" diameter +/- 0.5 mm x 0.525 +/- 0.025 mmth · Orientation: (100) +/- 0.5o · Polish: One sides polished · Surface roughness: Prime · Packing: Vacuum packed on a 4" single wafer carrier box
参数信息 | |
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外观状态: | 固体或粉末 |
质量指标: | 95%+ |
溶解条件: | 有机溶剂/水 |
CAS号: | N/A |
分子量: | N/A |
储存条件: | -20℃避光保存 |
储存时间: | 1年 |
运输条件: | 室温2周 |
生产厂家: | 上海金畔生物科技有限公司 |