Si+BN薄膜

Si+BN薄膜

Si+BN薄膜,BN Film coated by sputtering method

产品介绍

Boron nitride is a chemical compound with chemical formula BN, consisting of equal numbers of boron d nitrogen atoms. BN is isoelectronic to a similarly structured carbon lattice d thus exists in various crystalline forms. The Cubic (sphalerite structure) bariety alogous to diamond is called c-BN. Its hardness is inferior only to diamond, but its thermal d chemical stability is superior. Low-pressure deposition of thin films of boron nitride are grown on Si (100) wafers for this product. · BN Film coated by sputtering method · BN Thickness: 24 nm +/- 10% · Conductive type: Si n- type · Resistivity: 1- 10 ohm-cm · Size: 4" diameter +/- 0.5 mm x 0.525 +/- 0.025 mmth · Orientation: (100) +/- 0.5o · Polish: One sides polished · Surface roughness: Prime · Packing: Vacuum packed on a 4" single wafer carrier box
参数信息
外观状态: 固体或粉末
质量指标: 95%+
溶解条件: 有机溶剂/水
CAS号: N/A
分子量: N/A
储存条件: -20℃避光保存
储存时间: 1年
运输条件: 室温2周
生产厂家: 上海金畔生物科技有限公司