Description:

Variety of vdW layers are deposited onto sapphire, SiO2/Si, d other custom substrates. Example material systems include GaS, GaSe,h-BN, GaTe, SnS, SnSe, d others. Typical substrate size measure 1cm2 with 0.5mm2 active area of 2D layers. These layered materials have been deposited using atomic layer deposition growth procedure established at our facilities between 2016-2018. All the product are rated at 6N (99.9999%) purity, defect free, electronic, d optical grade quality. Single crystal size is much larger th conventional CVD, MOCVD, or PLD techniques. 

样品照片：

ALD-GaS thin film

ALD-GaTe thin film

ALD-GaSe thin film